Film formation methods for thin-film silicon solar cells using laser technology and plasma CVD technology.
★Completely abandoning the conventional methods for creating transparent conductive films and solar cell layers, this is a method of applying raw materials to a glass substrate and heating and sintering them with a laser!
Speaker Part 1: Takahisa Mineno, Specially Appointed Professor, Graduate School of Science, Osaka University, Doctor of Science, Laser Energy Research Center Part 2: Hiroshi Takatsuka, Chief Engineer, Solar Cell Division, Mitsubishi Heavy Industries, Ltd. Target Audience: Engineers, researchers, and educators interested in Si film deposition for solar cells. Venue: Moriguchi City Civic Hall (Satsuki Hall Moriguchi) B1F Room 1 [Osaka, Moriguchi] Approximately a 5-minute walk north from Keihan Moriguchi Station, or about a 1-minute walk west from Exit 4 of Tanimachi Line Moriguchi Station. Date and Time: September 28, 2011 (Wednesday) 13:30-16:15 Capacity: 30 people. *Registration will close once full. Please apply early. Participation Fee: [Early Bird Discount Price] 46,200 yen (tax included, including text costs) for up to 2 participants from one company. *Limited to Tech-Zone members who apply by September 14. Membership registration is free. *After September 14, the [Regular Price] will be 49,350 yen (tax included, including text costs) for up to 2 participants from one company. ◆ If 3 participants from the same organization apply, the fee will be 69,300 yen.
- Company：AndTech
- Price：10,000 yen-100,000 yen
